San Francisco, California, February 26, 2019 — Today, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, and KMLabs, pioneers and world leaders in ultrafast laser and EUV technology, announce a joint development to create a real-time functional imaging and interference lithography laboratory. This lab will enable imaging in resist on 300mm wafers down to an unprecedented 8nm pitch. Additionally, it will enable time-resolved nanoscale characterization of complex materials and processes, such as photoresist radiation chemistry, two-dimensional materials, nanostructured systems and devices, emergent quantum materials.